Ferroelectric thin films for optical applications

Presently the installation of optical fibers for high bandwidth communicati on services experiences an explosive growth on a world wide scale. As a con sequence, a growing demand for more complex integrated optical devices is f orseeable. At present, the technology for electrooptic integrated devices a nd components has been mostly satisfied by bulk LiNbO3, which is by far the most important optical ferroelectric. We will review the state of the art of "near-surface-modified"-ferroelectric devices, which have been patterned on bulk substrates and their potential counterparts to be fabricated compl etely in thin film technology on different substrates. Special emphasis wil l be laid upon theepitaxy of LiNbO3, BaTiO3 and (Pb, La) (Zr, Ti)O-3.