A read-disturb-free ferroelectric gate FET memory

Citation
Y. Shimada et al., A read-disturb-free ferroelectric gate FET memory, INTEGR FERR, 34(1-4), 2001, pp. 1467-1476
Citations number
8
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Eletrical & Eletronics Engineeing
Journal title
INTEGRATED FERROELECTRICS
ISSN journal
10584587 → ACNP
Volume
34
Issue
1-4
Year of publication
2001
Pages
1467 - 1476
Database
ISI
SICI code
1058-4587(2001)34:1-4<1467:ARFGFM>2.0.ZU;2-J
Abstract
The enhancement-type ferroelectric gate field-effect transistor (FeFET) req uires a read biasing voltage to the gate to secure a sufficient on/off curr ent ratio. However, disturb (depolarization) of the ferroelectric by repeti tive applications of read biasing voltage to the gate is a potential reliab ility concern. This paper deals with the disturb issue for an experimentall y fabricated FeFET with a stacked gate comprised of metal/SrBi2Ta2O9/CeO2. A significant difference between a high ON current and a low OFF current is brought about and sustained after a large number of read operations by cho osing a proper gate voltage, which is not only enough to make a positively programmed FeFET turn on, but also effective to prevent the disturb effect.