Crystalline and optical properties of PLZT films prepared by pulsed laser deposition

The PLZT(3/66/34), PLZT(3/46/54), PLZT(9/65/35) and PLZT(28/0/100) thin fil ms were deposited on MgO(100), Sapphire(0001) and fused silica substrates b y using pulsed KrF excimer laser deposition technique. The conventional in- situ and 2-step heating processes were utilized to facilitate the synthesis of a large area of uniform PLZT thin film. Pure perovskite phase can be ob tained only under very narrow process conditions, the highly textured PLZT films can be easily obtained by in-situ heating process. For PLZT(28/0/100) material, epitaxial films were successfully coated on MgO(100) substrates by 600 degreesC in-situ and RTA 650 degreesC 2-step heating processes. The latter was found to possess higher refractive index and lower extinction co efficient.