X. Lansiaux et al., Lithium niobate thick films grown by RF sputtering: Correlation between optical analysis and transmission electron microscopy observations, INTEGR FERR, 31(1-4), 2000, pp. 105-116
We report on the low temperature process for depositing epitaxial LiNbO3 (0
001) thick films on sapphire (0001) substrates by radio-frequency magnetron
sputtering. To obtain this objective, we have developed a multi-steps proc
ess. Structural studies carried out through x-ray theta -2 theta and phi sc
ans measurements revealed that the epitaxy is verified at a substrate tempe
rature of 490 degreesC whatever the film thickness. The crystalline propert
ies and the surface morphologies are rather conserved in the multi steps pr
ocess of deposition. Optical prism coupling characterizations have been car
ried out to qualify the film and the interface between the film and the sub
strate. A discussion is proposed in relationship with transmission electron
microscopy (TEM) analysis.