Surface morphology and electronic state characterization of Ni-P amorphousalloy films

Thin films of Ni-P amorphous alloy were deposited by electroless plating on to a p-type silicon substrate. The films underwent a cyclic oxidation-reduc tion or a crystallization treatments, respectively. The amorphous structure and its crystallization were studied by X-ray diffraction (XRD), different ial scanning calorimetry (DSC), extended X-ray absorption fine structure (E XAFS), scanning electron microscopy (SEM), atomic force microscopy (AFM), s canning tunneling microscopy (STM). The change in the surface composition a nd surface electronic state were investigated by X-ray photoelectron spectr oscopy (XPS). (C) 2001 Elsevier Science B.V. All rights reserved.