Raman study of fractal voids in hot-pressed SiO2

Citation
A. Chmel et al., Raman study of fractal voids in hot-pressed SiO2, J NON-CRYST, 281(1-3), 2001, pp. 125-132
Citations number
24
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF NON-CRYSTALLINE SOLIDS
ISSN journal
00223093 → ACNP
Volume
281
Issue
1-3
Year of publication
2001
Pages
125 - 132
Database
ISI
SICI code
0022-3093(200103)281:1-3<125:RSOFVI>2.0.ZU;2-J
Abstract
The sensitivity of the dynamic (vibrational) properties of fractal nanocrac ks in hot-pressed silica to the thermal and mechanical prehistory of the ma terial was studied by low-frequency Raman scattering. Samples were prepared from gel-derived and fused powdery products. The Raman data demonstrate th e fractality of elementary continuity defects. From the frequency dependenc e of the Raman intensity, the values of the fracton (spectral) dimension th at reflects the mid-range order in glass, and the dimensions of fractals in real space were calculated. (C) 2001 Elsevier Science B.V. All rights rese rved.