Thin film supercapacitors using a sputtered RuO2 electrode

Citation
Jh. Lim et al., Thin film supercapacitors using a sputtered RuO2 electrode, J ELCHEM SO, 148(3), 2001, pp. A275-A278
Citations number
13
Categorie Soggetti
Physical Chemistry/Chemical Physics","Material Science & Engineering
Journal title
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
ISSN journal
00134651 → ACNP
Volume
148
Issue
3
Year of publication
2001
Pages
A275 - A278
Database
ISI
SICI code
0013-4651(200103)148:3<A275:TFSUAS>2.0.ZU;2-Q
Abstract
An all solid-state thin film supercapacitor (TFSC) was fabricated with an a morphous ruthenium oxide (RuO2) thin film electrode and an amorphous LixPOy Nz (Lipon) thin film electrolyte. The electrochemical behavior of the RuO2/ Lipon/RuO2/Pt TFSC was characterized by a charge-discharge technique in the potential range of 0-2 V. The RuO2/Lipon/RuO2/Pt TFSC exhibited a behavior of a bulk-type supercapacitor, even though the capacity of an as-fabricate d TFSC was found to be much lower than the bulk one and showed a rapid decr ease in capacity. This can be explained by excess oxygen ions and interfaci al structure modification. The discharge yield dropped by 53% after 500 cyc les. The capacitance per volume of the RuO2/Lipon/RuO2/Pt TFSC at the first cycle is 38 mF/cm(2) mum. (C) 2001 The Electrochemical Society. All rights reserved.