Multiscale modeling of thin-film deposition: Applications to Si device processing

Authors
Baumann, FH Chopp, DL de la Rubia, TD Gilmer, GH Greene, JE Huang, H Kodambaka, S O'Sullivan, P Petrov, I
Citation
Fh. Baumann et al., Multiscale modeling of thin-film deposition: Applications to Si device processing, MRS BULL, 26(3), 2001, pp. 182-189
Citations number
25
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
MRS BULLETIN
ISSN journal
08837694 → ACNP
Volume
26
Issue
3
Year of publication
2001
Pages
182 - 189
Database
ISI
SICI code
0883-7694(200103)26:3<182:MMOTDA>2.0.ZU;2-1