Monitoring of carrier lifetime in GaAs substrate-epi-layer structures by space-resolved transient microwave absorption

Citation
E. Gaubas et al., Monitoring of carrier lifetime in GaAs substrate-epi-layer structures by space-resolved transient microwave absorption, NUCL INST A, 460(1), 2001, pp. 35-40
Citations number
5
Categorie Soggetti
Spectroscopy /Instrumentation/Analytical Sciences","Instrumentation & Measurement
Journal title
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT
ISSN journal
01689002 → ACNP
Volume
460
Issue
1
Year of publication
2001
Pages
35 - 40
Database
ISI
SICI code
0168-9002(20010311)460:1<35:MOCLIG>2.0.ZU;2-7
Abstract
New techniques of transient microwave absorption and their application for the extraction of recombination parameters of SI GaAs with different doping concentrations and layered n(+)-epi-GaAs structures are presented. Experim entally obtained decay kinetic shape and lifetime variations indicate multi -centre recombination and trapping effects. In highly doped material the ex tracted absolute carrier lifetime values of 10-50 ns in the substrate and 3 00-500 ns in the epi-layer allow the evaluation of the higher quality of th e epi-layer. A depth scan of the excess carrier decay in the epi-layer reve aled that carrier lifetime Values of 1-3 mus measured in the undoped materi al are nearly homogeneous in the epi-layer, while they decrease towards the epi-substrate boundary. (C) 2001 Elsevier Science B.V. All rights reserved .