X-ray photoemission study of low-energy ion beam induced changes on copperphthalocyanine film

Authors
Ji, ZG Wong, KW Wang, M Tse, KPK Kwok, RWM Lau, WM
Citation
Zg. Ji et al., X-ray photoemission study of low-energy ion beam induced changes on copperphthalocyanine film, NUCL INST B, 174(3), 2001, pp. 311-316
Citations number
15
Categorie Soggetti
Spectroscopy /Instrumentation/Analytical Sciences","Instrumentation & Measurement
Journal title
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS
ISSN journal
0168583X → ACNP
Volume
174
Issue
3
Year of publication
2001
Pages
311 - 316
Database
ISI
SICI code
0168-583X(200104)174:3<311:XPSOLI>2.0.ZU;2-N
Abstract
Vacuum-deposited copper phthalocyanine (CuPc) film was bombarded by a low-e nergy argon ion (Ar+) beam. The surface changes induced were studied in det ail using X-ray photoelectron spectroscopy. It shows that even if the ion e nergy is as low as 100 eV, the surface of the CuPc film undergoes severe st ructural changes. Ring rupture was clearly observed after only several minu tes of ion bombardment. In addition, the original Cu(II) in CuPc was found reduced to Cu(I) and present with the residues of the damaged ring. The for mation of this thin Cu(I) containing layer could significantly affect the o verall properties of the CuPc film as an organic functional layer. (C) 2001 Elsevier Science B.V. All rights reserved.