YBCO wafer qualification by surface resistance measurements combined with performance studies of microstrip resonators

Citation
R. Schwab et al., YBCO wafer qualification by surface resistance measurements combined with performance studies of microstrip resonators, PHYSICA C, 351(1), 2001, pp. 25-28
Citations number
5
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
PHYSICA C
ISSN journal
09214534 → ACNP
Volume
351
Issue
1
Year of publication
2001
Pages
25 - 28
Database
ISI
SICI code
0921-4534(20010301)351:1<25:YWQBSR>2.0.ZU;2-N
Abstract
High quality double-sided YBCO wafers with ceria buffered sapphire substrat es are analysed for the lateral homogeneity and field dependence of the sur face resistance (R-S) using an open resonator at 145 GHz and a dielectric r esonator at 8.5 GHz. In a following step, a set of linear microstrip resona tors are patterned on these wafers and are analysed for their high frequenc y performance at 4 GHz. The results reveal surface resistance analysis of Y BCO wafers as a reliable basis for materials qualification, At low power le vels the high Q-factors of the microstrip resonators (about 30 000) are con sistent with the measured R-S-values at the considerably higher frequencies , Further the power handling capabilities of the resonators agree with the measured field dependence of R-S. Surface resistance mappings at 145 GHz ef fectively indicates critical film areas for non-optimum microstrip resonato r performance. (C) 2001 Elsevier Science B.V. All rights reserved.