Sb is used as a surfactant for the growth of MnSi1.7 by reactive deposition
of Mn on Si(001). It is found that the presence of Sb during the growth st
rongly increases the island density and changes the crystalline orientation
of the MnSi1.7. The morphology and structure of the resulting silicide are
the same both for the deposition of Mn only on a Sb-terminated Si(001) sur
face and for the codeposition of Mn and Sb on Si(001). A residual Sb covera
ge close to one monolayer at the sample surface has been determined for bot
h of the preparation conditions. (C) 2001 American Institute of Physics.