Temperature-dependent magnetoresistance of magnetic tunnel junctions with ultraviolet light-assisted oxidized barriers

Co(10 nm)/AlOx(nominally 2 nm)/Co(20 nm) tunnel junctions have been prepare d under ultrahigh vacuum conditions applying a shadow mask technique. An ul traviolet light-assisted oxidation process of the AlOx barrier has been opt imized by in situ x-ray photoelectron spectroscopy, in conjunction with tem perature-dependent tunneling magnetoresistance measurements. Optimum-oxidiz ed tunnel junctions show a magnetoresistance of 20% at 285 K, and up to 38% at 100 K. For under-oxidized samples, with a remaining Al layer between th e Co bottom electrode and the AlOx barrier, the tunneling magnetoresistance decreases more rapidly with increasing temperature than observed for the o ver-oxidized samples. The resistance x area product of optimum-oxidized tun neling junctions exhibits a minimum, and increases for under- and over-oxid ized samples. (C) 2001 American Institute of Physics.