zeta-potentials of planar silicon plates covered with alkyl- and fluoroalkylsilane self-assembled monolayers
Citation
A. Hozumi et al., zeta-potentials of planar silicon plates covered with alkyl- and fluoroalkylsilane self-assembled monolayers, COLL SURF A, 182(1-3), 2001, pp. 257-261
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
COLLOIDS AND SURFACES A-PHYSICOCHEMICAL AND ENGINEERING ASPECTS
SICI code
0927-7757(20010630)182:1-3<257:ZOPSPC>2.0.ZU;2-A
Abstract
zeta -potentials of planar Si plates covered with an alkyl- or a fluoroalky
l organosilane self-assembled monolayer (SAM) were measured over a pH range
of 3-11 by means of an electrophoretic light scattering spectrophotometer,
and were compared with those of Si plates covered with native oxide (SiO2)
, polyethylene (PE) and polytetrafluoroethylene (PTFE). The SAMs were prepa
red on SiO2/Si substrates by a chemical vapor deposition (CVD) method in wh
ich an alkylsilane, that is, octadecyltrimethoxysilane [CH3(CH2)(17)Si(OCH3
)(3), i.e. ODS] or a fluoroalkylsilane, that is, (heptadecafluoro-1,1,2,2-t
etrahydrodecyl) trimethoxysilane [CF3(CF2)(7)CH2CH2Si(OCH3)(3), i.e. FAS] w
as used as a precursor. The SAM-covered Si plates were found to be 35-65% l
ess charged than the SiO2/Si plate. Furthermore, SAM formation reduced surf
ace acidity. The isoelectric points (IEPs) of the ODS- and FAS-SAM surfaces
observed at pH 3.5-4 were higher than that of SiO2/Si (similar to pH 2.0).
These results are attributable to a reduction in the density of surface si
lanol (Si-OH) groups on the SiO2/Si substrate. Si-OH groups were consumed d
ue to the formation of siloxane bondings with the organosilane molecules wh
ich compose the SAMs. Finally, the IEPs of the ODS- and FAS-SAM covered sur
faces were found to be almost identical to those of the PE and PTFE bulk su
rfaces. (C) 2001 Elsevier Science B.V. All rights reserved.