A multistep junction termination extension (MJTE) for SIC power devices, wh
ich uses a single-step ion implantation and multiple dry etches, is studied
by way of two-dimensional numerical simulations and confirmed by fabricati
ng and measuring a high-voltage implanted 4H-SiC pin diode. It is shown tha
t MJTE is a very effective approach and can be easily implemented in experi
ment.