Fabrication of high-purity V-4Cr-4Ti low activation alloy products

Citation
T. Nagasaka et al., Fabrication of high-purity V-4Cr-4Ti low activation alloy products, FUSION TECH, 39(2), 2001, pp. 659-663
Citations number
11
Categorie Soggetti
Nuclear Emgineering
Journal title
FUSION TECHNOLOGY
ISSN journal
07481896 → ACNP
Volume
39
Issue
2
Year of publication
2001
Part
2
Pages
659 - 663
Database
ISI
SICI code
0748-1896(200103)39:2<659:FOHVLA>2.0.ZU;2-U
Abstract
High-purity V-4Cr-4Ti low activation alloy products, such as plates and wir es, were fabricated from the NIFS-HEAT-1 ingot with improvements of the con ventional manufacturing processes. During fabrication, significant and smal l increase in hydrogen and oxygen level were observed, respectively. Howeve r, these contaminants were released by a heat treatment at 673 K or higher in a vacuum. For the purpose of obtaining an appropriate thermomechanical t reatment condition, recrystallization behavior of plate products, which wer e 6.6, 4.0, 1.9 mm thick, was investigated after cold rolling. It was revea led that annealing at 1273 K for one to two hours provides recrystallized g rains of 20-30 mum. Only in the case of 1.9 mm-thick plates which experienc ed large degree of cross rolling, a layer of finer grain was observed in th e vicinity of the surface. The NIFS-HEAT-1 products are going through Round -robin tests by Japanese universities.