Fs. Shieu et al., CHARACTERIZATION OF THE ION-PLATED TIN ON AISI-304 STAINLESS-STEEL BYENERGY-FILTERING TRANSMISSION ELECTRON-MICROSCOPY, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 15(4), 1997, pp. 2318-2322
Citations number
18
Categorie Soggetti
Physics, Applied","Materials Science, Coatings & Films
The microstructure and chemistry of TiN coatings on AISI 304 stainless
steel:was characterized by a Zeiss EM 902A energy filtering transmiss
ion electron microscope (TEM) equipped with an electron energy loss sp
ectroscopy (EELS) detector. Deposition of the TiN thin films was carri
ed out by a hollow cathode discharge ion plating coater. The microstru
cture across the coating thickness direction and near the TiN/steel in
terfaces was investigated by plan-view TEM. It was found that the micr
ostructure of the TiN coatings is thickness dependent. The grain size
of TIN ranges from 88 nm at the coating surface down to 9 nm near the
TiN/steel interface. In addition, the TIN surface layer shows slightly
textured microstructure, but the subsurface and internal TIN layers h
ave mainly equiaxial and randomly oriented microstructure. Chemical an
alysis of the coating and the interfacial region was done by EELS. It
was obtained that the relative oxygen content increases linearly from
the TiN surface to the TiN/steel interface, whereas the relative nitro
gen content first decreases slowly and then drops rapidly near the int
erface. The presence of a Ti2N phase and the deficiency of nitrogen ne
ar the TiN/steel interface suggest that the early deposited TiN may be
nonstoichiometry. (C) 1997 American Vacuum Society.