Dynamic behavior of thermionic dispenser cathodes under ion bombardment

Citation
R. Cortenraad et al., Dynamic behavior of thermionic dispenser cathodes under ion bombardment, J APPL PHYS, 89(8), 2001, pp. 4354-4364
Citations number
47
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF APPLIED PHYSICS
ISSN journal
00218979 → ACNP
Volume
89
Issue
8
Year of publication
2001
Pages
4354 - 4364
Database
ISI
SICI code
0021-8979(20010415)89:8<4354:DBOTDC>2.0.ZU;2-2
Abstract
We have investigated the surface coverage and electron emission of thermion ic dispenser cathodes during 3 keV Ar+ ion bombardment, thereby simulating the bombardment of the cathodes by residual gases that takes place in catho de-ray tubes as used in television sets. During the ion bombardment at the operating temperature of 1030 degreesC, a dynamic equilibrium is establishe d between the sputter removal and resupply mechanisms of the Ba and O atoms that form the dipole layer on the cathode substrate. We demonstrated that the performance of the cathodes under ion bombardment is governed by the O removal and resupply rates. It was found that the Ba resupply rate is almos t an order of magnitude higher than the O resupply rate, but that the Ba ca n only be present on the surface bound to O atoms. Therefore, the Ba/O rati o is approximately equal to unity during the ion bombardment. Based on the investigations of the removal and resupply processes, we proposed a model t hat accurately describes the surface coverage and electron emission during the ion bombardment, including the dependence of the ion flux and cathode t emperature. (C) 2001 American Institute of Physics.