Hexagonal voids and the formation of micropipes during SiC sublimation growth

Citation
Ta. Kuhr et al., Hexagonal voids and the formation of micropipes during SiC sublimation growth, J APPL PHYS, 89(8), 2001, pp. 4625-4630
Citations number
26
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF APPLIED PHYSICS
ISSN journal
00218979 → ACNP
Volume
89
Issue
8
Year of publication
2001
Pages
4625 - 4630
Database
ISI
SICI code
0021-8979(20010415)89:8<4625:HVATFO>2.0.ZU;2-U
Abstract
Hexagonal voids observed in sublimation grown SiC boules were examined usin g optical microscopy, atomic force microscopy (AFM), scanning electron micr oscopy, KOH etching, and synchrotron white-beam x-ray topography. Voids for med at imperfections in the attachment layer between the seed and crucible cap. They are platelet-like in shape with lateral sizes between 50 and 750 mum and thickness along the c axis between 5 and 25 mum. Growth steps were observed on the void facets closest to the seed and evaporation steps were observed on void facets closest to the growth surface, providing evidence f or void movement during crystal growth. AFM images revealed that growth ste ps nucleate at a void sidewall, flow across the bottom of the void, and ter minate in a trench-like depression. KOH etching of waters between the void and seed revealed dislocations lining up along the trace of the void path, often with higher densities corresponding to the location of the trench. X- ray topographs showed a random distribution of screw dislocations in the cr ystal volume above the void, and an absence of screw dislocations in the vo lume directly below the void. Hollow-core superscrew dislocations, called m icropipes, were found at the corners of the void trace. Image forces associ ated with growth steps and void sidewalls are used to explain the formation of micropipes. (C) 2001 American Institute of Physics.