Hydrogen adsorption on a HfC(111) surface: angle-resolved photoemission study

Citation
K. Edamoto et al., Hydrogen adsorption on a HfC(111) surface: angle-resolved photoemission study, J ELEC SPEC, 114, 2001, pp. 495-499
Citations number
12
Categorie Soggetti
Spectroscopy /Instrumentation/Analytical Sciences
Journal title
JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA
ISSN journal
03682048 → ACNP
Volume
114
Year of publication
2001
Pages
495 - 499
Database
ISI
SICI code
0368-2048(200103)114:<495:HAOAHS>2.0.ZU;2-Q
Abstract
Angle-resolved photoemission spectroscopy utilizing synchrotron radiation h as been used to study the adsorption of hydrogen on a HfC(111) surface. It is found that hydrogen adsorbs dissociatively on the HfC(111) surface formi ng a (1X1) overlayer at the saturation coverage. A H1s-induced bonding stat e which is split-off from the substrate valence band is found at 7.2 eV at the <(<Gamma>)over bar> point. In addition, another H-induced state is foun d at just below the Fermi level in off-normal-emission spectra, and the sta te is ascribed to an extrinsic surface state caused through the H-induced m odification of surface electronic states. (C) 2001 Elsevier Science B.V. Al l rights reserved.