Depth-resolved photoemission spectroscopy with soft X-ray standing waves

Citation
Sh. Yang et al., Depth-resolved photoemission spectroscopy with soft X-ray standing waves, J ELEC SPEC, 114, 2001, pp. 1089-1095
Citations number
25
Categorie Soggetti
Spectroscopy /Instrumentation/Analytical Sciences
Journal title
JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA
ISSN journal
03682048 → ACNP
Volume
114
Year of publication
2001
Pages
1089 - 1095
Database
ISI
SICI code
0368-2048(200103)114:<1089:DPSWSX>2.0.ZU;2-K
Abstract
Depth-resolved soft X-ray photoemission spectroscopy (SXPS) is performed in which depth sensitivity is provided by use of a periodic multilayer [B4C ( 22.5 Angstrom)/W (17.1 Angstrom)(40)] that shows sizeable standing wave eff ects of +/- similar to 50-60% for soft X-rays at hv approximate to 750 eV. The photoelectron intensities of each element in the sample, including impu rity overlayers, are sharply altered when the incidence angle is tuned over the Bragg condition, in excellent agreement with theoretical simulations. The angular dependence of the photoelectron intensity also shows unique che mical-state resolved behavior depending on the location of a given species in the multilayer structure. Depth-resolved SXPS with soft X-ray standing w ave excitation should thus be a very useful tool for studying surface and i nterface chemical, electronic and magnetic properties. (C) 2001 Elsevier Sc ience B.V. All rights reserved.