TiB2 thin films demonstrate considerable potential for use as protective ov
ercoats in the magnetic recording industry due to their excellent mechanica
l and tribological properties and good chemical and thermal stability. In t
he many studies performed on TiB2 films, the relative effectiveness of ultr
athin TiB2 films has not been systematically investigated for very thin TiB
2 films. In the present investigation, film stress and microstructure in as
-sputtered and annealed ultrathin TiB2 films were investigated as a functio
n of thickness. Ultrathin TiB2 films, as thin as 5 nm, were observed to ade
quately protect an underlying magnetic layer from oxidation up to 400 degre
esC.