Resonance Raman spectroscopic investigation of the mechanism and kinetics of the degradation of N,N-hexamethylene bishexamide, a Nylon 6,6 model compound
H. Matsui et al., Resonance Raman spectroscopic investigation of the mechanism and kinetics of the degradation of N,N-hexamethylene bishexamide, a Nylon 6,6 model compound, POLYMER, 42(13), 2001, pp. 5625-5632
We report a mechanistic study of the photo-oxidative degradation of N,N-hex
amethylene bishexamide, a Nylon 6,6 model compound. Resonant Raman intensit
ies of the amide and its previously identified enal degradation product art
: recorded as a function of the duration of the irradiation of the amide wi
th 266 nm laser pulses. The time dependences of the Raman intensities an co
nsistent with those predicted by a kinetic mechanism for photo-oxidation. I
n particular, the rate of formation of the enal, probed by monitoring the R
aman intensity of its C=O stretch peak at 1680 cm(-1), agrees well with the
rate of cleavage of the C-N bond in the amide, revealed by the time depend
ence of the intensity of the Am II (C-N stretch) vibration at 1537 cm(-1).
Rate constants for important steps in the degradation mechanism are obtaine
d from the analysis. (C) 2001 Elsevier Science Ltd. All rights reserved.