Evaluating plasma-etch resistance of high-performance plastics

Authors
Campbell, RW
Citation
Rw. Campbell, Evaluating plasma-etch resistance of high-performance plastics, SOL ST TECH, 44(4), 2001, pp. 91
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
SOLID STATE TECHNOLOGY
ISSN journal
0038111X → ACNP
Volume
44
Issue
4
Year of publication
2001
Database
ISI
SICI code
0038-111X(200104)44:4<91:EPROHP>2.0.ZU;2-2
Abstract
Selecting the material for making components, such as wafer clamp-rings, wh ich are exposed to plasma etch processing requires information on their ero sion rates and the metal impurities that they can release. Here, for the fi rst time, are comparative data for plastics generally considered for such c omponents.