The program speed of a selected cell and the program disturbance of unselec
ted cells sharing the common program-line in split-gate source-side injecte
d flash memory has been investigated. It is found that the program disturba
nce becomes severe as the control gate length decreases. In this letter, we
first propose a novel program technique by applying a negative bias to inh
ibited word-line to improve the trade-off between program speed and program
disturbance. The experimental results indicate that the new program techni
que is a good candidate for future high-density, high-disturbance-immunity
flash EEPROM memory applications. (C) 2001 Elsevier Science Ltd. All rights
reserved.