Effect of exponentially distributed deep levels on the current and capacitance of a MIS diode

Citation
S. Sanyal et P. Chattopadhyay, Effect of exponentially distributed deep levels on the current and capacitance of a MIS diode, SOL ST ELEC, 45(2), 2001, pp. 315-324
Citations number
14
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Eletrical & Eletronics Engineeing
Journal title
SOLID-STATE ELECTRONICS
ISSN journal
00381101 → ACNP
Volume
45
Issue
2
Year of publication
2001
Pages
315 - 324
Database
ISI
SICI code
0038-1101(200102)45:2<315:EOEDDL>2.0.ZU;2-#
Abstract
An exponential distribution of deep level impurities has been considered to evaluate the current and capacitance of MIS diode with special reference t o recombination effect modified for distributed defects. The de current and conductance of the device have been found to vary non-lineally in logarith mic scale mainly because of recombination at lower voltages. Likewise, the capacitance of the device is also influenced due to the presence of exponen tially distributed defects. The investigation reveals a distinct non-linear ity in the I/C-2 vs, V characteristics with concavity upward or downward de termined by the parametric values of the defects. The nature of variation o f I-V and C-V characteristics have been found much sensitive to the paramet ers controlling the defect distribution. (C) 2001 Elsevier Science Ltd. All rights reserved.