Study of the effect of manganese impurities on dielectric characteristics of BSTO films

Citation
Sf. Karmanenko et al., Study of the effect of manganese impurities on dielectric characteristics of BSTO films, TECH PHYS, 46(4), 2001, pp. 498-502
Citations number
15
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
TECHNICAL PHYSICS
ISSN journal
10637842 → ACNP
Volume
46
Issue
4
Year of publication
2001
Pages
498 - 502
Database
ISI
SICI code
1063-7842(2001)46:4<498:SOTEOM>2.0.ZU;2-C
Abstract
Capacitance voltage and current voltage characteristics of BSTO ferroelectr ic films containing a manganese dioxide impurity (similar to 1.5-2 mol %) a re compared to those of impurity-free samples. It is shown that in Mn-doped samples tan delta drops to 10(-3), and the dependence of tan delta on the applied voltage changes as well. IVCs of these samples are strictly ohmic a nd do not show a nonlinearity at high voltages. A mechanism is proposed of the effect of Mn on the charge state of the defects comprising oxygen vacan cies in BSTO films. (C) 2001 MAIK "Nauka/Interperiodica".