Temporal characteristics of net excitation rates in inductively coupled plasma in Ar and CF4 by one-dimensional relaxation continuum modeling

Authors
Hou, K Nakagarni, S Makabe, T
Citation
K. Hou et al., Temporal characteristics of net excitation rates in inductively coupled plasma in Ar and CF4 by one-dimensional relaxation continuum modeling, THIN SOL FI, 386(2), 2001, pp. 239-242
Citations number
7
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
THIN SOLID FILMS
ISSN journal
00406090 → ACNP
Volume
386
Issue
2
Year of publication
2001
Pages
239 - 242
Database
ISI
SICI code
0040-6090(20010515)386:2<239:TCONER>2.0.ZU;2-8
Abstract
Plasma structure in an inductively coupled plasma reactor is numerically in vestigated in electropositive Ar and electronegative CF4 under the lowest s ustaining condition. In the case of Ar, the discharge is maintained under t he influence of an azimuthal electric field, whilst the CF4 plasma is elect rostatically sustained by a radial field under the presence of negative ion s F-. (C) 2001 Elsevier Science B.V. All rights reserved.