Development of a compact nitrogen radical source by helicon-wave dischargeemploying a permanent magnet

Citation
K. Sasaki et al., Development of a compact nitrogen radical source by helicon-wave dischargeemploying a permanent magnet, THIN SOL FI, 386(2), 2001, pp. 243-247
Citations number
14
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
THIN SOLID FILMS
ISSN journal
00406090 → ACNP
Volume
386
Issue
2
Year of publication
2001
Pages
243 - 247
Database
ISI
SICI code
0040-6090(20010515)386:2<243:DOACNR>2.0.ZU;2-T
Abstract
We have developed a nitrogen radical source excited by helicon-wave dischar ge in Nz gas. The major features of the present radical source are: (1) hig h electron and radical densities; (2) low operational gas pressure below 1 mtorr; and (3) compactness by employing a permanent magnet. This radical so urce has potential applications in production of various nitride films such as GaN and beta -C3N4. (C) 2001 Elsevier Science B.V. All rights reserved.