Production of Nb thin film by ECR sheet plasma

The production technique of thin film is described by using sheet-shaped el ectron cyclotron resonance heating (ECRH) plasma supplemented with RF plasm a source for controlling the plasma parameters. The deposition rate of thin film onto the substrate can be varied from 6 to 102 nm/min depending on th e experimental conditions. The thin film is almost uniformly formed over th e wide range of plasma parameters. The present experimental technique can b e applied to the plasma source for material processing such as thin film, s emiconductor devices, and so on. (C) 2001 Elsevier Science B.V. All rights reserved.