Xq. Jiang et al., HIGH-ACCURACY WAVELENGTH-CHANGE MEASUREMENT SYSTEM BASED ON A WOLLASTON INTERFEROMETER, INCORPORATING A SELF-REFERENCING SCHEME, Applied optics, 36(21), 1997, pp. 4907-4912
A novel wavelength-difference measurement scheme with a Wollaston pris
m is presented. By using a suitable reference wavelength, a small vari
ation in the signal wavelength can be converted into a relatively larg
er change in the modulated wavelength, as a result of the so-called fr
inge beating effect, resulting in enhanced measurement sensitivity by
use of autocorrelation and Gaussian filtering techniques. From the res
ults of a simulation carried out. we observed a wavelength variation o
f 0.01 nm over 15 nm or 0.1 nm over 60 nm for a typical pair of laser
diodes with wavelengths of 785 and 810 nm, and wavelength variations o
f 0.5 nm over 40 nm or 1 nm over 110 nm for 671 -and 785-nm wavelength
s. These results were partially verified by the experimental results o
btained for which a resolution of 0.01 nm over a range of 2.5 nm for t
he first pair and 0.5 nm over 4 nm for the second pair of laser diodes
was seen. The results have applications to the determination of wavel
ength variations in a wavelength-division multiplexing system or measu
rement of the wavelength changes induced in a range of optical sensors
. (C) 1997 Optical Society of America.