Self-induced voltage oscillations during anodic etching of n-InP and possible applications for three-dimensional microstructures

Citation
S. Langa et al., Self-induced voltage oscillations during anodic etching of n-InP and possible applications for three-dimensional microstructures, EL SOLID ST, 4(6), 2001, pp. G50-G52
Citations number
13
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
ELECTROCHEMICAL AND SOLID STATE LETTERS
ISSN journal
10990062 → ACNP
Volume
4
Issue
6
Year of publication
2001
Pages
G50 - G52
Database
ISI
SICI code
1099-0062(200106)4:6<G50:SVODAE>2.0.ZU;2-M
Abstract
Voltage oscillations were observed during anodic etching of (100)-oriented n-InP substrates in an aqueous solution of HCl at high constant current den sity. Under certain conditions, the oscillations lead to a synchronous modu lation of the diameters of pores on large areas of the samples which indica tes a correlation between the phases of the oscillations in the pores. Thes e self-induced diameter oscillations may be useful for three-dimensional mi crostructuring of n-InP and thus for the design and fabrication of new phot onic materials. (C) 2001 The Electrochemical Society.