Formation of radiation defects in high-purity silicate glasses in dependence on dopants and UV radiation sources

Citation
U. Natura et al., Formation of radiation defects in high-purity silicate glasses in dependence on dopants and UV radiation sources, GL SCI T-GL, 74(2), 2001, pp. 23-31
Citations number
8
Categorie Soggetti
Material Science & Engineering
Journal title
GLASS SCIENCE AND TECHNOLOGY-GLASTECHNISCHE BERICHTE
ISSN journal
09467475 → ACNP
Volume
74
Issue
2
Year of publication
2001
Pages
23 - 31
Database
ISI
SICI code
0946-7475(200102)74:2<23:FORDIH>2.0.ZU;2-Q
Abstract
The radiation-resistance of high-purity glasses (approximate to1 ppm iron) of the type BK7 (R), DURAN (R) and lead silicate (PbS) with high transmissi on in the UV region was studied. The investigations were concentrated on th e influence of UV-absorbing dopants on defect generation. These were refini ng agents, As2O3, Sb2O3, NaCl, and TiO2 as solarization suppressing agent f or the visible range in BK7, and small impurities of tin ions in DURAN. The samples were irradiated with UV lamps and excimer lasers (XeCl-308 nm, KrF -248 nn, ArF-193 nm). The defect generation increases with the use of refin ing agents in BK7 and with the presence of small amounts of Sn2+ in DURAN. The influence of TiO2, on the defect generation strongly depends on the rad iation source. A model explaining the defect generation in these glasses is suggested.