Low-operation voltage of InGaN/GaN light-emitting diodes by using a Mg-doped Al0.15Ga0.85N/GaN superlattice

Citation
Jk. Sheu et al., Low-operation voltage of InGaN/GaN light-emitting diodes by using a Mg-doped Al0.15Ga0.85N/GaN superlattice, IEEE ELEC D, 22(4), 2001, pp. 160-162
Citations number
15
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
IEEE ELECTRON DEVICE LETTERS
ISSN journal
07413106 → ACNP
Volume
22
Issue
4
Year of publication
2001
Pages
160 - 162
Database
ISI
SICI code
0741-3106(200104)22:4<160:LVOILD>2.0.ZU;2-H
Abstract
Low-resistivity Mg-doped Al0.15Ga0.85N/GaN strained-layer superlattices wer e grown. In these superlattices, the maximum hole concentration is 3 x 10(1 8)/cm(3) at room temperature. Hall-effect measurements indicate high conduc tivity of this structure in which the high activation efficiency is attribu ted to the strain-induced piezoelectric fields. This work also fabricated I nGaN/GaN blue LEDs that consist of a Mg-doped Al0.15Ga0.85N/GaN SLs. Experi mental results indicate that the LEDs can achieve a lower operation voltage of around 3 V, i.e., smaller than conventional devices which have an opera tion voltage of about 3.8 V.