A self-consistent method to extract the off-state floating-body (FB) voltag
e of SOI CMOS devices is presented. The technique is simple and is based on
CV and S-parameter measurements of a single standard SOI MOSFET device; no
special test structure design is needed. The bias dependent S-parameter me
asurements of the FB SOI device and its equivalent circuit, along with the
CV measurements between the drain and source of the same device, are used t
o determine the FB voltage, The technique provides reasonable insight on de
vice off-state and leakage performances that are important for digital appl
ications. Additionally, it proposes a method for the extraction of the para
sitic source, drain, and gate resistances, Using the technique,FB voltage i
n excess of 0.4 V is measured in a partially depleted (PD) NMOS device at d
rain voltage of 2.5 V and zero gate voltage, demonstrating the importance o
f understanding FB effects on device off-state and junction leakage perform
ances.