This brief demonstrates that conventional thin-oxide EEPROM cells can be pr
ogrammed (erased) in the nanosecond time scale with voltages lower than 18
V still featuring data retention times of the order of a few hours after 10
0K program/erase (P/E) cycles, Our results suggest that thin-oxide nonvolat
ile (NV) memory; devices can be suitable for fast read/write dynamic applic
ations, at least when high cycling endurance is not a primary specification
.