RF W-band wafer-to-wafer transition

Citation
Kj. Herrick et Lpb. Katehi, RF W-band wafer-to-wafer transition, IEEE MICR T, 49(4), 2001, pp. 600-608
Citations number
13
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
IEEE TRANSACTIONS ON MICROWAVE THEORY AND TECHNIQUES
ISSN journal
00189480 → ACNP
Volume
49
Issue
4
Year of publication
2001
Part
1
Pages
600 - 608
Database
ISI
SICI code
0018-9480(200104)49:4<600:RWWT>2.0.ZU;2-S
Abstract
Multiwafer silicon designs must provide an avenue for electrical signals to flow from wafer to wafer, For this purpose, a two-layer electrical bond is proposed to provide electrical connection between two coplanar waveguides printed on the adjacent faces of two vertically stacked silicon wafers. In addition to serving as a versatile low-temperature thermocompression wafer bond, loss of approximately 0.1 dB is measured for this novel compact packa ged wafer-to-wafer transition from 75 to 110 GHz.