Hydrolysis deposition of thin films of antimony-doped tin oxide

Authors
Tsukuma, K Akiyama, T Imai, H
Citation
K. Tsukuma et al., Hydrolysis deposition of thin films of antimony-doped tin oxide, J AM CERAM, 84(4), 2001, pp. 869-871
Citations number
12
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF THE AMERICAN CERAMIC SOCIETY
ISSN journal
00027820 → ACNP
Volume
84
Issue
4
Year of publication
2001
Pages
869 - 871
Database
ISI
SICI code
0002-7820(200104)84:4<869:HDOTFO>2.0.ZU;2-J
Abstract
Thin films of antimony-doped tin oxide have been obtained by a new techniqu e, the so-called hydrolysis deposition method, in which hydrolyzed solids a re precipitated from metal fluoride solutions. Mixed solutions of SnF3 and SbF3 produce antimony- and fluorine-doped tin oxide films. The amount of an timony can be controlled in a wide range by adjusting the initial fluoride concentrations of the solution. The Film containing 2.9 mol% antimony heate d at 500 degreesC has an electrical resistivity of 1.0 x 10(-3) Omega .cm, which is lower than previously obtained by wet-chemical techniques.