Hydrogen peroxide oxygen precursor for zinc oxide electrodeposition I. Deposition in perchlorate medium

Cathodic electrodeposition of zinc oxide is demonstrated using dissolved hy drogen peroxide as the oxygen precursor. Unlike molecular oxygen, H2O2 is a very soluble compound in water and can consequently be used at high concen trations allowing high deposition rates. Unlike nitrate ions, the reduction reaction does not give rise to by-products, which may progressively contam inate the deposition bath. ZnO films have been deposited at 70 degreesC and -1.4 V vs, a saturated sulfate mercurous electrode onto tin oxide over a l arge range of peroxide concentration with perchlorate as the supporting ele ctrolyte. The films are well covered and crystallized with the wurtzite str ucture and textured with the c axis perpendicular to the electrode surface. A transition between dense films and porous films is observed at the highe r H2O2 concentration investigated. At 40 mM H2O2, the porosity of the films deposited in the presence of 80 mM zinc perchlorate is estimated at 33% wi th deposition rare of cn. 16 mum h(-1) (C) 2001 The Electrochemical Society . All rights reserved.