Effect of laser irradiation on electrophoretically coated phosphors for field emission displays

Citation
Jp. Hong et al., Effect of laser irradiation on electrophoretically coated phosphors for field emission displays, J ELCHEM SO, 148(4), 2001, pp. H45-H48
Citations number
11
Categorie Soggetti
Physical Chemistry/Chemical Physics","Material Science & Engineering
Journal title
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
ISSN journal
00134651 → ACNP
Volume
148
Issue
4
Year of publication
2001
Pages
H45 - H48
Database
ISI
SICI code
0013-4651(200104)148:4<H45:EOLIOE>2.0.ZU;2-U
Abstract
Laser treatment on electrophoretically deposited phosphors has been perform ed as one of the efficient postannealing methods in order to improve the br ightness of the phosphor coated on indium-tin oxide-coated glasses. A Nd:YA G continuous wave (lambda = 1064 nm) laser was mainly used as an irradiatio n source. Two basic parameters, such as laser power and treatment time, wer e examined inside a high-vacuum chamber. The experimental results presented useful laser-annealing time and enhanced improvement of about 10% in the b rightness after the laser irradiation on the phosphor. In addition, another Nd:YAG pulse laser (lambda = 355 nm) was briefly investigated in an effort to reduce any reactive radicals or possibly unnecessary bonding at the pho sphor surface through a photodecomposition process. The improvement in the luminescence was thought due to the surface cleaning effect on the phosphor surface. (C) 2001 The Electrochemical Society.