EPR-study of nitrogen implanted silicon nitride

Citation
Ai. Shames et al., EPR-study of nitrogen implanted silicon nitride, SOL ST COMM, 118(3), 2001, pp. 129-134
Citations number
21
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
SOLID STATE COMMUNICATIONS
ISSN journal
00381098 → ACNP
Volume
118
Issue
3
Year of publication
2001
Pages
129 - 134
Database
ISI
SICI code
0038-1098(2001)118:3<129:EONISN>2.0.ZU;2-E
Abstract
Electrons and holes localized in amorphous silicon nitride (Si3N4) were stu died by electron paramagnetic resonance (EPR). No EPR signals due to locali zed charges were observed in charged samples, containing high density of tr aps - almost stoichiometric Si3N4 N-implanted Si3N4 samples, characterized by a lower density of traps, also showed no corresponding EPR signals. The possible pairing of charges due to antiferromagnetic exchange interactions arising from resonant quantum tunneling has been proposed to explain the ab sence of signals in samples with high density of traps. We briefly describe various models of spin-pairing including a Wigner glass of bipolarons, wit h a pair of charges trapped at neighboring traps, and discuss them in conne ction with the experimental data. (C) 2001 published by Elsevier Science Lt d.