Amorphous hydrogenated carbon-nitrogen alloy thin films for solar cell application

Amorphous hydrogenated carbon-nitrogen alloy (a-CNx:H) thin films have been deposited on silicon substrates by improved de magnetron sputtering from a graphite target in nitrogen and hydrogen gas discharging. The films are in vestigated by using Raman spectroscopy x-ray photoelectron spectroscopy spe ctral ellipsometer and electron spin resonance techniques. The optimized pr ocess condition for solar cell application is discussed. The photovoltaic p roperty of a-CNx:H/silicon heterojunctions can be improved by the adjustmen t of the pressure ratio of hydrogen to nitrogen and unbalanced magnetic fie ld intensity. Open-circuit voltage and short-circuit current reach 300mV an d 5.52mA/cm(2), respectively.