XAS, XRD, AFM and Raman studies of nickel tungstate electrochromic thin films

Citation
A. Kuzmin et al., XAS, XRD, AFM and Raman studies of nickel tungstate electrochromic thin films, ELECTR ACT, 46(13-14), 2001, pp. 2233-2236
Citations number
14
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
ELECTROCHIMICA ACTA
ISSN journal
00134686 → ACNP
Volume
46
Issue
13-14
Year of publication
2001
Pages
2233 - 2236
Database
ISI
SICI code
0013-4686(20010402)46:13-14<2233:XXAARS>2.0.ZU;2-P
Abstract
Systematic studies of nanocrystalline nickel tungstate, NiWO4, thin films w ere performed by several experimental techniques such as Ni K- and W L-1.3- edges X-ray absorption spectroscopy, X-ray diffraction, Raman spectroscopy, atomic force microscopy and cyclic voltammetry measurements. We found that the NiWO4 thin films exhibit electrochromic properties similar to that of amorphous tungsten trioxide films, but show better structural stability upo n multiple colouring/bleaching cycling. It was observed that a nanocrystall inity of the thin films results in strong modifications of the Ni-O and W-O interactions, which affect both local atomic and vibrational structures. ( C) 2001 Elsevier Science Ltd. All rights reserved.