A. Crown et al., Examination of Pt(111)/Ru and Pt(111)/Os surfaces: STM imaging and methanol oxidation activity, J ELEC CHEM, 500(1-2), 2001, pp. 333-343
Ruthenium and osmium were deposited in submonolayer amounts on Pt(111) sing
le crystal surfaces using the previously reported 'spontaneous deposition'
procedure [Chrzanowski et al., Langmuir, 13 (1997) 5974]. Such surfaces wer
e first explored using ex situ scanning tunneling microscopy (STM) to image
the deposition characteristics of ruthenium and osmium islands on Pt(111).
It was found that, using the spontaneous deposition procedure, a maximum c
overage of 0.20 ML ruthenium is formed on the surface after 120 s of exposu
re to a RuCl3 solution in 0.1 M HClO4. A homogeneous deposition on the Pt(1
11) surface was found, with no observed preferential deposition on step edg
es or surface defect sites. In contrast, in the spontaneous deposition of o
smium, osmium clusters form preferentially at, though not limited to, surfa
ce defect sites and step edges. Osmium island deposition occurs at a greate
r rate than ruthenium on Pt(111), and possible explanations are presented.
Methanol activity on the Pt(111)/Ru and Pt(111)/Os surfaces is also studied
, using the coverage values determined to yield the highest activity for me
thanol electro-oxidation (0.20 ML coverage for Ru and 0.15 ML for Os). At p
otentials more negative than 0.40 V vs. RHE, the Pt(111)/Ru surface yields
a higher surface activity than Pt(111)/Os. However, at potentials more posi
tive than 0.04 V, Pt(111)/Os exhibits demonstrably higher surface activity.
The relevance of this data is discussed and future avenues of interest are
indicated. (C) 2001 Elsevier Science B.V. All rights reserved.