Structure and property characterization of low-k dielectric porous thin films

A novel methodology is developed that uses a combination of high energy ion scattering, x-ray reflectivity, and small angle neutron scattering to char acterize the structure and properties of porous thin films. Ion scattering is used to determine the elemental composition of the film for absolute int ensity calibration of the x-ray and neutron scattering techniques. X-ray re flectivity is used to measure the average electron density and film thickne ss. Small angle neutron scattering is used to determine the pore size, stru cture, and connectivity. Combining information from all three techniques, t he film porosity and matrix material density can be uniquely determined.