The kinetics of the (root 3x root 3)R30 degrees sulfur lattice stripping from Au(111): Competitive desorption-hole nucleation and growth model

Citation
H. Martin et al., The kinetics of the (root 3x root 3)R30 degrees sulfur lattice stripping from Au(111): Competitive desorption-hole nucleation and growth model, LANGMUIR, 17(8), 2001, pp. 2334-2339
Citations number
24
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
LANGMUIR
ISSN journal
07437463 → ACNP
Volume
17
Issue
8
Year of publication
2001
Pages
2334 - 2339
Database
ISI
SICI code
0743-7463(20010417)17:8<2334:TKOT(3>2.0.ZU;2-6
Abstract
The stripping of the underpotential deposited (root 3x root3)R30 degrees su lfur lattice from Au(111) surfaces is studied by electrochemical techniques complemented with in situ scanning tunneling microscopy. The kinetics of t he stripping process fits a model where adsorption/desorption competes with nucleation and growth of two-dimensional holes under charge transfer contr ol. We propose that two phases compete for the electrode surface: a condens ed phase consisting of holes nucleated at defects of the adsorbed layer and a diluted phase consisting of randomly distributed vacancies produced by d esorption. The relative contribution of each process depends on the applied potential and the step density of the substrate.