A large variety of polymers has been proposed for use as materials with low
dielectric constants for applications in microelectronics. The chemical st
ructures and selected properties of these polymers are discussed in this re
view. Polyimides, heteroaromatic polymers, poly(aryl ether)s, fluoropolymer
s, hydrocarbon polymers without any polar groups, films deposited from the
gas phase by chemical vapor deposition, plasma enhanced chemical vapor depo
sition and other techniques are included. Based on the properties described
so far, and the requirements for applications as intermetal dielectric mat
erial. conclusions regarding the possibilities for further developments are
drawn. (C) 2001 Elsevier Science Ltd. All rights reserved.