Observation of current crowding near fabricated voids in gold lines

Citation
R. Yongsunthon et al., Observation of current crowding near fabricated voids in gold lines, APPL PHYS L, 78(18), 2001, pp. 2661-2663
Citations number
13
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
78
Issue
18
Year of publication
2001
Pages
2661 - 2663
Database
ISI
SICI code
0003-6951(20010430)78:18<2661:OOCCNF>2.0.ZU;2-R
Abstract
The spatial variation of current density in lines with model void defects f abricated using focused-ion beam milling has been imaged using magnetic for ce microscopy (MFM). At current densities of 3-4x10(6) A/cm(2), an asymmetr y in the MFM signal is clearly visible at (1x1) mum(2) and (0.5x0.5) mum(2) notches at the edge of a 10 mum wide line. Comparison to a simple model ca lculation suggests that the asymmetry is due to current crowding, with the displaced current 70% localized to within 1 mum of the notch. (C) 2001 Amer ican Institute of Physics.