H. Ofuchi et al., Fluorescence x-ray absorption fine structure study on local structures around Fe atoms heavily doped in GaN by low-temperature molecular-beam epitaxy, APPL PHYS L, 78(17), 2001, pp. 2470-2472
A local structural transition in heavily Fe-doped GaN films related to the
magnetic properties has been revealed by fluorescence x-ray absorption fine
structure (XAFS) analysis. The structural transition is explained (or cons
idered to be induced) by the change in the degree of hybridization between
Fe 3d and N 2p states, which can be evaluated by x-ray absorption near edge
structure spectra. The XAFS analysis indicates that the present diluted ma
gnetic semiconductor based on GaN can be fabricated by electron cyclotron r
esonance microwave plasma-assisted low-temperature molecular-beam epitaxy.
(C) 2001 American Institute of Physics.