Fluorescence x-ray absorption fine structure study on local structures around Fe atoms heavily doped in GaN by low-temperature molecular-beam epitaxy

Citation
H. Ofuchi et al., Fluorescence x-ray absorption fine structure study on local structures around Fe atoms heavily doped in GaN by low-temperature molecular-beam epitaxy, APPL PHYS L, 78(17), 2001, pp. 2470-2472
Citations number
20
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
78
Issue
17
Year of publication
2001
Pages
2470 - 2472
Database
ISI
SICI code
0003-6951(20010423)78:17<2470:FXAFSS>2.0.ZU;2-R
Abstract
A local structural transition in heavily Fe-doped GaN films related to the magnetic properties has been revealed by fluorescence x-ray absorption fine structure (XAFS) analysis. The structural transition is explained (or cons idered to be induced) by the change in the degree of hybridization between Fe 3d and N 2p states, which can be evaluated by x-ray absorption near edge structure spectra. The XAFS analysis indicates that the present diluted ma gnetic semiconductor based on GaN can be fabricated by electron cyclotron r esonance microwave plasma-assisted low-temperature molecular-beam epitaxy. (C) 2001 American Institute of Physics.