On the nature of the D-1-defect center in SiC: A photoluminescence study of layers grown by solid-source molecular-beam epitaxy

Citation
A. Fissel et al., On the nature of the D-1-defect center in SiC: A photoluminescence study of layers grown by solid-source molecular-beam epitaxy, APPL PHYS L, 78(17), 2001, pp. 2512-2514
Citations number
23
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
78
Issue
17
Year of publication
2001
Pages
2512 - 2514
Database
ISI
SICI code
0003-6951(20010423)78:17<2512:OTNOTD>2.0.ZU;2-C
Abstract
Undoped and boron-doped SiC layers are grown on hexagonal SiC(0001) substra tes by means of solid-source molecular-beam epitaxy. Hexagonal 4H- and 6H-S iC layers are grown homoepitaxially via step-controlled epitaxy, whereas th e cubic 3C-SiC is grown pseudomorphically via nucleation and subsequent ste p flow. The low-temperature photoluminescence spectra only show the well-kn own emission lines of the so-called D-1 center. The line positions are comp ared with results of first-principles calculations. The growth conditions, the line shape, and the line shift with the polytype support an interpretat ion as bound-exciton recombination at a native-defect complex that contains a Si vacancy. (C) 2001 American Institute of Physics.